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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:36:07Z	Effect of NH3/N-2 ratio in plasma treatment on porous low dielectric constant SiCOH materials	Huang, Jun-Fu; Bo, Tain-Cih; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; Cheng, Yi-Lung

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