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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
中原大學 2003-11-18 Method of forming twin-spacer gate flash device and the structure of the same Wen-Ying Wen;Jyhlong Horng;Erik S. Jeng;Bai-Jun Kuo;Chih-Hsueh Hung
中原大學 2002-04-23 Multiple etch contact etching method incorporating post contact etch etching Tzu-Shih Yen;Erik S. Jeng;I-Ping Lee;Eddy Chiang
中原大學 2002 The optical properties and applications of AlN thin films prepared by a Helicon sputtering system W. Y. Chiu;C. H. Wu;H. L. Kao;Erik S. Jeng
中原大學 2001-10-23 Method for forming self-aligned contact with liner Tzu-Shih Yen;Erik S. Jeng;Hsiao-Chin Tuan;Chun-Yao Chan;Eddy Chiang;Wen-Shiang Liao
中原大學 2001-07-24 Method for forming self-aligned contacts using a hard mask Tzu-Shih Yen;Erik S. Jeng;Hao-Chieh Liu;Hung-Yi Luo
中原大學 2001-06-19 Method of fabricating a self-aligned contact Chien-Sheng Hsieh;Wei-Ray Lin;Fu-Liang Yang;Erik S. Jeng;Bor-Ru Sheu
中原大學 2001-06-12 Method for producing multi-level contacts Bi-Ling Chen;Erik S. Jeng;Shih-Ming Chang
中原大學 2001-05-29 Method of self-aligned contact hole etching by fluorine-containing discharges Erik S. Jeng;Bi-Ling Chen
中原大學 2001-05-22 Method for forming a semiconductor device Erik S. Jeng;Tzu-Shih Yen;Chi-San Wu;Jong-Bor Wang
中原大學 2001-04-24 Anti-reflection oxynitride film for polysilicon substrates Liang-Gi Yao;John Chin-Hsiang Lin;Hua-Tai Lin;Erik S. Jeng;Hsiao-Chin Tuan
中原大學 2001-02-06 Method of fabricating a capacitor under bit line DRAM structure using contact hole liners Erik S. Jeng;Bi-Ling Chen;Wei-Ray Lin;Yu-Chun Ho;Ming-Hong Kuo
中原大學 2001-01-30 Formation of finely controlled shallow trench isolation for ULSI process Fu-Liang Yang;Bih-Tiao Lin;Wei-Ray Lin;Erik S. Jeng
中原大學 2001-01-23 DRAM using oxide plug in bitline contacts during fabrication Erik S. Jeng
中原大學 2001-01-02 Method for fabricating crown-shaped capacitor structures Erik S. Jeng;Ing-Ruey Liaw;Rong-Wu Chien
中原大學 2000-12-12 Method for fabricating borderless and self-aligned polysilicon and metal contact landing plugs for multilevel interconnections Erik S. Jeng;Bi-Ling Chen;Chien-Sheng Hsieh
中原大學 2000-11-21 Method of forming a cob dram by using self-aligned node and bit line contact plug Hung-Yi Luo;Erik S. Jeng;Yue-Feng Chen
中原大學 2000-10-31 Method for eliminating CMP induced microscratches Fu-Liang Yang;Bih-Tiao Lin;Tzu-Shih Yen;Bi-Ling Chen;Erik S. Jeng
中原大學 2000-10-24 Method for fabricating capacitor-over-bit-line dynamic random access memory (DRAM) using self-aligned contact etching technology Erik S. Jeng;Chun-Yao Chen;Ing-Ruey Liaw;Janmye Sung
中原大學 2000-10-24 Method to fabricate capacitor structures with very narrow features using silyated photoresist Tzu-Shih Yen;Erik S. Jeng
中原大學 2000-09-26 Method for fabricating ultra-small interconnections using simplified patterns and sidewall contact plugs Erik S. Jeng;Tzu-Shih Yen;Hung-Yi Luo
中原大學 2000-08-15 Method of forming a contact hole in a semiconductor device Erik S. Jeng;Bi-Ling Chen;Hao-Chieh Liu
中原大學 2000-06-27 Method for fabricating interconnection and capacitors of a DRAM using a simple geometry active area, self-aligned etching, and polysilicon plugs Erik S. Jeng
中原大學 2000-06-27 Method for forming multi-level contacts using a H-containing fluorocarbon chemistry Bi-Ling Chen;Erik S. Jeng;Hao-Chieh Liu
中原大學 2000-06-13 Method for forming multi-level contacts Hao-Chieh Liu;Erik S. Jeng;Bi-Ling Chen;Wan-Yih Lien
中原大學 2000-06-06 Method for simultaneously fabricating a DRAM capacitor and metal interconnections Fu-Liang Yang;Erik S. Jeng;Bih-Tiao Lin;I-Ping Lee

Showing items 6-30 of 48  (2 Page(s) Totally)
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