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Showing items 36-45 of 91 (10 Page(s) Totally)
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| 臺大學術典藏 |
2018-09-10T15:23:14Z |
Layout decomposition for Spacer-is-Metal (SIM) self-aligned double patterning
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Fang, S.-Y.;Tai, Y.-S.;Chang, Y.-W.; Fang, S.-Y.; Tai, Y.-S.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T14:57:59Z |
Overlay-Aware detailed routing for self-Aligned double patterning lithography using the cut process
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Liu, I.-J.;Fang, S.-Y.;Chang, Y.-W.; Liu, I.-J.; Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T14:57:59Z |
A novel layout decomposition algorithm for triple patterning lithography
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Fang, S.-Y.;Chang, Y.-W.;Chen, W.-Y.; Fang, S.-Y.; Chang, Y.-W.; Chen, W.-Y.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:48:07Z |
Stitch-aware routing for multiple e-beam lithography
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Fang, S.-Y.;Liu, I.-J.;Chang, Y.-W.; Fang, S.-Y.; Liu, I.-J.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:48:07Z |
Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling
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Fang, S.-Y.;Lin, C.-W.;Liao, G.-W.;Chang, Y.-W.; Fang, S.-Y.; Lin, C.-W.; Liao, G.-W.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:48:07Z |
Graph-based subfield scheduling for electron-beam photomask fabrication
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Fang, S.-Y.;Chen, W.-Y.;Chang, Y.-W.; Fang, S.-Y.; Chen, W.-Y.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:22:26Z |
Native-conflict and stitch-aware wire perturbation for double patterning technology
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Fang, S.-Y.; Chen, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:22:26Z |
Graph-based subfield scheduling for electron-beam photomask fabrication
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Fang, S.-Y.; Chen, W.-Y.; Chang, Y.-W.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:22:26Z |
A novel layout decomposition algorithm for triple patterning lithography
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Fang, S.-Y.; Chang, Y.-W.; Chen, W.-Y.; YAO-WEN CHANG |
| 臺大學術典藏 |
2018-09-10T09:22:25Z |
Simultaneous flare level and flare variation minimization with dummification in EUVL
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Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG |
Showing items 36-45 of 91 (10 Page(s) Totally)
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