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Taiwan Academic Institutional Repository >
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"hwu jenn gwo"
Showing items 81-90 of 210 (21 Page(s) Totally)
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| 國立臺灣大學 |
2001 |
Degradation in Metal-Oxide-Semiconductor Structure with Ultrathin Gate Oxide due to External Compressive Stress
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Hong, Chao-Chi; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
2001 |
Application of Anodization to Reoxidize Silicon Nitride Film
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Lin, Yen-Po; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
2000 |
Enhancement in soft breakdown occurrence of ultra-thin gate oxides caused by photon effect in rapid thermal post-oxidation annealing
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Huang, Chia-Hong; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
2000 |
Enhancement of Silicon Oxidation Rate due to Tensile Mechanical Stress
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Yen, Jui-Yuan; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1999-08 |
The Effect of Patterned Susceptor on the Thickness Uniformity of Rapid Thermal Oxides
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Lee, Kuo-Chung; Chang, Hong-Yuan; Chang, Hong; Hwu, Jenn-Gwo; Wung, Tzong-Shyan |
| 國立臺灣大學 |
1999 |
Fluorinated thin gate oxides prepared by room temperature deposition followed by furnace oxidation
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Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1999 |
Improvement in the electrical properties of thin gate oxides bychemical-assisted electron stressing followed by annealing (CAESA)
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Shih, Yen-Hao; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1997-06 |
Analog maximum, median and minimum circuit
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Liu, Shen-Iuan; Chen, Poki; Chen, Chin-Yang; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1996 |
Rapid thermal post-metallization annealing effect on thin gate oxides
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Jeng, Ming-Jer; Lin, Huang-Shen; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1996 |
Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics
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Lee, Kuo-Chung; Hwu, Jenn-Gwo |
Showing items 81-90 of 210 (21 Page(s) Totally)
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