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Institution Date Title Author
中原大學 2010-04 Gate Oxide Weat out Using Novel Polysilazane-base Inorganic as Nano-scaling Shallow Trench Filling Ching Yuan. Ho;Kai-Yao.Shih ; jr Hau He,
中原大學 2009-08 Investigation of Gate Oxide Wear out Using Polysilazane-base Inorganic as Shallow Trench Filling Ching-Yuan. Ho; Kai-Yao. Shih; Jr Hau He

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