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"kwo j"的相關文件
顯示項目 306-315 / 563 (共57頁)
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| 臺大學術典藏 |
2018-09-10T07:34:14Z |
High performance self-aligned inversion-channel MOSFETs with In 0.53 Ga 0.47 As channel and ALD-Al 2 O 3 gate dielectric
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Chiu, HC;Chang, P;Huang, ML;Lin, TD;Chang, YH;Huang, JC;Chen, SZ;Kwo, J;Tsai, Wen-Ru;Hong, M; Chiu, HC; Chang, P; Huang, ML; Lin, TD; Chang, YH; Huang, JC; Chen, SZ; Kwo, J; Tsai, Wen-Ru; Hong, M; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:13Z |
Self-aligned inversion-channel In 0.75 Ga 0.25 As MOSFETs using MBE-Al 2 O 3/Ga 2 O 3 (Gd 2 O 3) and ALD-Al 2 O 3 as gate dielectrics
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Lin, TD;Chiu, HC;Chang, P;Chang, YH;Lin, CA;Chang, WH;Kwo, J;Tsai, W;Hong, M; Lin, TD; Chiu, HC; Chang, P; Chang, YH; Lin, CA; Chang, WH; Kwo, J; Tsai, W; Hong, M; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:13Z |
Superconducting Bi-Sr-Ca-Cu-O films by sputtering using a single oxide target
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Hong, M;Yeh, J-J;Kwo, J;Felder, RJ;Miller, A;Nassau, K;Bacon, DD; Hong, M; Yeh, J-J; Kwo, J; Felder, RJ; Miller, A; Nassau, K; Bacon, DD; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:13Z |
Inversion-channel GaN MOSFET using atomic-layer-deposited Al 2 O 3 as gate dielectric
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Chang, YC;Chang, WH;Chiu, HC;Chang, YH;Tung, LT;Lee, CH;Hong, M;Kwo, J;Hong, JM;Tsai, CC; Chang, YC; Chang, WH; Chiu, HC; Chang, YH; Tung, LT; Lee, CH; Hong, M; Kwo, J; Hong, JM; Tsai, CC; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:13Z |
Energy-band parameters of atomic-layer-deposited Al $ _ ${$2$}$ $ O $ _ ${$3$}$ $ and HfO $ _ ${$2$}$ $ on InxGa $ _ ${$1-x$}$ $ As
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Huang, ML;Chang, YC;Chang, YH;Lin, TD;Hong, M;Kwo, J; Huang, ML; Chang, YC; Chang, YH; Lin, TD; Hong, M; Kwo, J; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:12Z |
High performance Ga 2 O 3 (Gd 2 O 3)/Ge MOS devices without interfacial layers
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Chu, LK;Chu, RL;Huang, ML;Tung, LT;Lin, TD;Chang, CC;Kwo, J;Hong, M; Chu, LK; Chu, RL; Huang, ML; Tung, LT; Lin, TD; Chang, CC; Kwo, J; Hong, M; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:12Z |
Single-phase high Tc superconducting Tl2Ba2Ca2Cu3O1 0 films
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Hong, M;Kwo, J;Chen, CH;Kortan, AR;Bacon, DD;Liou, SH; Hong, M; Kwo, J; Chen, CH; Kortan, AR; Bacon, DD; Liou, SH; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:12Z |
Metal-oxide-semiconductor devices with UHV-Ga 2 O 3 (Gd 2 O 3) on Ge (100)
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Chu, LK;Lin, TD;Lee, CH;Tung, LT;Lee, WC;Chu, RL;Chang, CC;Hong, Mingyi;Kwo, J; Chu, LK; Lin, TD; Lee, CH; Tung, LT; Lee, WC; Chu, RL; Chang, CC; Hong, Mingyi; Kwo, J; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:11Z |
SINGLE-PHASE HIGH Tc SUPERCONDUCTING
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Hong, M;Kwo, J;Chen, CH;Kortan, AR;Bacon, DD;Liou, SH; Hong, M; Kwo, J; Chen, CH; Kortan, AR; Bacon, DD; Liou, SH; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T07:34:11Z |
Achieving nearly free fermi-level movement and V th engineering in Ga 2 O 3 (Gd 2 O 3)/In 0.2 Ga 0.8 As
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Lin, TD;Wu, YD;Chang, YC;Chiang, TH;Chuang, CY;Lin, CA;Chang, WH;Chiu, HC;Tsai, W;Kwo, J;others; Lin, TD; Wu, YD; Chang, YC; Chiang, TH; Chuang, CY; Lin, CA; Chang, WH; Chiu, HC; Tsai, W; Kwo, J; others; MINGHWEI HONG |
顯示項目 306-315 / 563 (共57頁)
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