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Showing items 1-25 of 65 (3 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T05:59:33Z |
Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation
|
Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY |
| 國立交通大學 |
2019-04-02T05:59:15Z |
The performance indicators for science and technology projects in Taiwan
|
Yang, C; Tarng, MY; Lai, CS; Lin, ZB |
| 國立交通大學 |
2019-04-02T05:58:50Z |
The TEOS CVD oxide deposited on phosphorus in situ doped polysilicon with rapid thermal annealing
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Kao, CH; Lai, CS; Lee, CL |
| 國家衛生研究院 |
2017-07-07 |
CCM111, the water extract of Antrodia cinnamomea, regulates immune-related activity through STAT3 and NF-kappaB pathways
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Lin, IY;Pan, MH;Lai, CS;Lin, TT;Chen, CT;Chung, TS;Chen, CL;Lin, CH;Chuang, WC;Lee, MC;Lin, CC;Ma, N |
| 中國醫藥大學 |
2015-05 |
Se-Methyl-L-selenocysteine Induces Apoptosis via Endoplasmic Reticulum Stress and the Death Receptor Pathway in Human Colon Adenocarcinoma COLO 205 Cells
|
(Tung, YC);(Tsai, ML);(Kuo, FL);(Lai, CS);(Badmaev, V);(Ho, CT);潘敏雄(Min-Hsiung Pan)* |
| 國立交通大學 |
2014-12-08T15:49:13Z |
Characterization of polysilicon oxides thermally grown and deposited on the polished polysilicon films
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Lei, TF; Cheng, JY; Shiau, SY; Chao, TS; Lai, CS |
| 國立交通大學 |
2014-12-08T15:47:36Z |
Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation
|
Lai, CS; Chao, TS; Lei, TF; Lee, CL; Huang, TY; Chang, CY |
| 國立交通大學 |
2014-12-08T15:46:36Z |
Chain dynamics of concentrated polystyrene solutions studied by depolarized photon-correlation and viscosity measurements
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Lai, CS; Juang, JH; Lin, YH |
| 國立交通大學 |
2014-12-08T15:44:00Z |
High reliability polyoxide fabricated by using TEOS oxide deposited on disilane polysilicon film
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Lee, JW; Lee, CL; Lei, TF; Lai, CS |
| 國立交通大學 |
2014-12-08T15:27:34Z |
Low temperature (850 degrees C) two-step N2O annealed thin gate oxides
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Lai, CS; Lee, CL; Lei, TF; Chao, TS; Peng, CH; Wang, HC |
| 國立交通大學 |
2014-12-08T15:25:51Z |
The impact of STI induced reliabilities for scaled p-MOSFET in an advanced multiple oxide CMOS technology
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Chung, SS; Yeh, CH; Feng, SJ; Lai, CS; Yang, JJ; Chen, CC; Jin, Y; Chen, SC; Liang, MS |
| 國立交通大學 |
2014-12-08T15:25:27Z |
A new observation of the germanium outdiffusion effect on the hot carrier and NBTI reliabilities in sub-100nm technology strained-Si/SiGe CMOS devices
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Chung, SS; Liu, YR; Yeh, CF; Wu, SR; Lai, CS; Chang, TY; Ho, JH; Liu, CY; Huang, CT; Tsai, CT; Shiau, WT; Sun, SW |
| 國立交通大學 |
2014-12-08T15:25:11Z |
A new insight into the degradation mechanisms of various mobility-enhanced CMOS devices with different substrate engineering
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Chung, SS; Liu, YR; Wu, SJ; Lai, CS; Liu, YC; Chen, DF; Lin, HS; Shiau, WT; Tsai, CT; Chien, SC; Sun, SW |
| 國立交通大學 |
2014-12-08T15:19:23Z |
Effects of post CF(4) plasma treatment on the HfO(2) thin film
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Lai, CS; Wu, WC; Fan, KM; Wang, JC; Lin, SJ |
| 國立交通大學 |
2014-12-08T15:19:05Z |
Characterization of CF4-plasma fluorinated HfO2 gate dielectrics with TaN metal gate
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Lai, CS; Wu, WC; Wang, JC; Chao, T |
| 國立交通大學 |
2014-12-08T15:17:51Z |
Oxide grown on polycrystal silicon by rapid thermal oxidation in N2O
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Kao, CH; Lai, CS; Lee, CL |
| 國立交通大學 |
2014-12-08T15:17:09Z |
Impact of STI on the reliability of narrow-width pMOSFETs with advanced ALD N/O gate stack
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Chung, SS; Yeh, CH; Feng, HJ; Lai, CS; Yang, JJ; Chen, CC; Jin, Y; Chen, SC; Liang, MS |
| 國立交通大學 |
2014-12-08T15:16:56Z |
Characteristics of fluorine implantation for HfO2 gate dielectrics with high-temperature postdeposition annealing
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Lai, CS; Wu, WC; Wang, JC; Cha, TS |
| 國立交通大學 |
2014-12-08T15:03:13Z |
THE ELECTRICAL CHARACTERISTICS OF POLYSILICON OXIDE GROWN IN PURE N2O
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LAI, CS; LEI, TF; LEE, CL |
| 國立交通大學 |
2014-12-08T15:03:06Z |
POST-POLYSILICON GATE-PROCESS-INDUCED DEGRADATION ON THIN GATE OXIDE
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LAI, CS; LEI, TF; LEE, CL; CHAO, TS |
| 國立交通大學 |
2014-12-08T15:02:40Z |
A novel vertical bottom-gate polysilicon thin film transistor with self-aligned offset
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Lai, CS; Lee, CL; Lei, TF; Chern, HN |
| 國立交通大學 |
2014-12-08T15:02:33Z |
Nitridization of the stacked poly-Si gate to suppress the boron penetration in pMOS
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Lin, YH; Lai, CS; Lee, CL; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:02:30Z |
Dynamics of a ''Rouse'' segment as probed by depolarized photon-correlation and viscoelasticity measurements
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Lin, YH; Lai, CS |
| 國立交通大學 |
2014-12-08T15:02:10Z |
The performance indicators for science and technology projects in Taiwan
|
Yang, C; Tarng, MY; Lai, CS; Lin, ZB |
| 國立交通大學 |
2014-12-08T15:01:22Z |
The TEOS CVD oxide deposited on phosphorus in situ doped polysilicon with rapid thermal annealing
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Kao, CH; Lai, CS; Lee, CL |
Showing items 1-25 of 65 (3 Page(s) Totally)
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