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Showing items 46-50 of 50 (2 Page(s) Totally)
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| 國立成功大學 |
2002-12-02 |
Spectroscopic ellipsometry study on the structure of Ta2O5/SiOxNy/Si gate dielectric stacks
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2002-07 |
Effects of plasma prenitridation and postdeposition annealing on the structural and dielectric characteristics of the Ta2O5/Si system
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Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, Jen-Sue |
| 國立成功大學 |
2002-05-15 |
Investigation of the interlayer characteristics of Ta2O5 thin films deposited on bare, N2O, and NH3 plasma nitridated Si substrates
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Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, Jen-Sue |
| 國立成功大學 |
2001-07 |
Characterization of tantalum pentoxide dielectric films grown by low-pressure and plasma-enhanced chemical vapor deposition
|
Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2001-07 |
Comparison of dielectric characteristics of Ta2O5 thin films on RuO2 and Ru bottom electrodes
|
Huang, J. H.; Lai, Yi-Sheng; Chen, Jen-Sue |
Showing items 46-50 of 50 (2 Page(s) Totally)
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