English  |  正體中文  |  简体中文  |  0  
???header.visitor??? :  52486909    ???header.onlineuser??? :  1140
???header.sponsordeclaration???
 
臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
???ui.leftmenu.abouttair???

???ui.leftmenu.bartitle???

???index.news???

???ui.leftmenu.copyrighttitle???

???ui.leftmenu.link???

"ou keng liang"???jsp.browse.items-by-author.description???

???jsp.browse.items-by-author.back???
???jsp.browse.items-by-author.order1??? ???jsp.browse.items-by-author.order2???

Showing items 161-166 of 166  (7 Page(s) Totally)
<< < 1 2 3 4 5 6 7 
View [10|25|50] records per page

Institution Date Title Author
臺北醫學大學 2004 High Cu Diffusion Resistance in Ultrathin Multi-quasi-amorphous CVD-Ti/TiNx Films Ou,Keng-Liang; Chiou,Shi-Yung; Lin,Ming-Hong
臺北醫學大學 2004 Nanostructured TaN(O)/TaN barrier film formed by oxygen plasma treatment for copper interconnect Ou,Keng-Liang; Lin,Ming-Hong; Chiou,Shi-Yung
臺北醫學大學 2003 Effects of nitrogen plasma treatment on tantalum diffusion barriers in copper metallization Wu,Wen-Fa; Ou,Keng-Liang; Chou,Chang-Pin; Wu,Chi-Chang
臺北醫學大學 2003 PECVD-Ti/TiNx barrier with multilayered amorphous structure and high thermal stability for copper metallization Wu,Wen-Fa; Ou,Keng-Liang; Chou,Chang-Pin; Hsua,Jwo-Lun
臺北醫學大學 2002 Improved TaN Barrier Layer Against Cu Diffusion by Formation of an Amorphous Layer Using Plasma Treatment Ou,Keng-Liang; Wu,Wen-Fa; Chou,Chang-Pin; Chiou,Shi-Yung; Wu,Chi-Chang
臺北醫學大學 2001 Barrier Capability of TaNx Films Deposited by Different Nitrogen Flow Rate Against Cu Diffusion in Cu/TaNx/n+-p Junction Diodes Yang,Wen-Luh; Wu,Wen-Fa; Liu,Don-Gey; Wu,Chi-Chang; Ou,Keng Liang

Showing items 161-166 of 166  (7 Page(s) Totally)
<< < 1 2 3 4 5 6 7 
View [10|25|50] records per page