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| 國立交通大學 |
2018-08-21T05:56:34Z |
Full Low Temperature Microwave Processed Ge CMOS Achieving Diffusion-Less Junction and Ultrathin 7.5nm Ni Mono-Germanide
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Lee, Y. -J.; Chuang, S. -S.; Liu, C. -I.; Hsueh, F. -K.; Sung, P. -J.; Chen, H. -C.; Wu, C. -T.; Lin, K. -L.; Yao, J. -Y.; Shen, Y. -L.; Kuo, M. -L.; Yang, C. -H.; Luo, G. -L.; Chen, H. -W.; Lai, C. -H.; Current, M. I.; Wu, C. -Y.; Wan, Y. -M.; Tseng, T. -Y.; Hu, Chenming; Yang, F. -L. |
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