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Showing items 366-372 of 372 (15 Page(s) Totally)
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| 臺大學術典藏 |
1993 |
Improved Gate Oxide Reliability by Repeated N20 Rapid Thermal Annealings
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Wu, Y. L.; Hwu, Jenn-Gwo; Wu, Y. L.; 胡振國; Wu, Y. L.; Hwu, Jenn-Gwo; Wu, Y. L. |
| 臺大學術典藏 |
1993 |
Improved Performance of n-MOSFET's with Reoxidized Nitrided Oxide (RNO) by Using N20 as the Reoxidizer
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Wu, Z. Y.; Wu, Y. L.; Hwu, Jenn-Gwo; 胡振國; Wu, Z. Y.; Wu, Y. L.; Hwu, Jenn-Gwo; Wu, Y. L. |
| 國立臺灣大學 |
1992 |
Effect of Fast Pulling the Starting Oxide Out of Furnace on the Radiation Hardness of MOS Capacitors with Reoxidixed-Nitrided Oxides
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胡振國; Wu, Y. L.; Hwu, Jenn-Gwo; Wu, Y. L. |
| 國立臺灣大學 |
1992 |
Improvement in Surface Cleaning of Oxides by Rapid Thermal Annealing
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胡振國; Lin, J. J.; Wu, Y. L.; Hwu, Jenn-Gwo; Lin, J. J.; Wu, Y. L. |
| 臺大學術典藏 |
1992 |
Effect of Fast Pulling the Starting Oxide Out of Furnace on the Radiation Hardness of MOS Capacitors with Reoxidixed-Nitrided Oxides
|
Wu, Y. L.; Hwu, Jenn-Gwo; 胡振國; Wu, Y. L.; Hwu, Jenn-Gwo |
| 臺大學術典藏 |
1992 |
Improvement in Surface Cleaning of Oxides by Rapid Thermal Annealing
|
Wu, Y. L.; Hwu, Jenn-Gwo; Lin, J. J.; 胡振國; Lin, J. J.; Wu, Y. L.; Hwu, Jenn-Gwo; Lin, J. J. |
| 國立臺灣大學 |
1963 |
Spectrophotometric Study of the Complexes of Ge, Zr and Hf with Gallein
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Pan, K.; 林聖賢; Wu, Y. L.; Chen, Y. M.; Pan, K.; Lin, Sheng-Hsien; Wu, Y. L.; Chen, Y. M. |
Showing items 366-372 of 372 (15 Page(s) Totally)
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