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Showing items 66-75 of 117  (12 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:43:56Z Characteristics of fluorinated amorphous carbon films and implementation of 0.15 mu m Cu/a-C : F damascene interconnection Shieh, JM; Suen, SC; Tsai, KC; Dai, BT; Wu, YC; Wu, YH
國立交通大學 2014-12-08T15:42:15Z Reduction of etching plasma damage on low dielectric constant fluorinated amorphous carbon films by multiple H-2 plasma treatment Shieh, JM; Tsai, KC; Dai, BT; Wu, YC; Wu, YH
國立交通大學 2014-12-08T15:27:03Z Rf loss and cross talk on extremely high resistivity (10K-1M Omega-cm) Si fabricated by ion implantation Wu, YH; Chin, A; Shih, KH; Wu, CC; Liao, CP; Pai, SC; Chi, CC
國立交通大學 2014-12-08T15:27:03Z The performance limiting factors as RF MOSFETs scaling down Wu, YH; Chin, A; Liang, CS; Wu, CC
國立交通大學 2014-12-08T15:27:03Z High quality La2O3 and Al2O3 gate dielectrics with equivalent oxide thickness 5-10 angstrom Chin, A; Wu, YH; Chen, SB; Liao, CC; Chen, WJ
國立交通大學 2014-12-08T15:20:27Z The market size of a city-pair route at an airport Hsu, CI; Wu, YH
國立交通大學 2014-12-08T15:03:34Z SYNTHESIS OF SIDE-CHAIN LIQUID-CRYSTALLINE POLYMETHACRYLATES CONTAINING FLUORINATED DIARYLACETYLENE-BASED MESOGENIC SIDE-GROUPS WU, YH; LU, YH; HSU, CS
國立交通大學 2014-12-08T15:03:23Z CHARACTERISTICS OF GRADED-LIKE MULTIPLE-DELTA-DOPED GAAS FIELD-EFFECT TRANSISTORS KAO, MJ; HSU, WC; HSU, RT; WU, YH; LIN, TY; CHANG, CY
國立交通大學 2014-12-08T15:03:22Z THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS LIOU, BW; WU, YH; LEE, CL; LEI, TF
國立交通大學 2014-12-08T15:01:44Z Hydrogen and oxygen plasma effects on polycrystalline silicon thin films of various thicknesses Liou, BW; Lee, CL; Lei, TF; Wu, YH

Showing items 66-75 of 117  (12 Page(s) Totally)
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