|
English
|
正體中文
|
简体中文
|
总笔数 :0
|
|
造访人次 :
52280329
在线人数 :
865
教育部委托研究计画 计画执行:国立台湾大学图书馆
|
|
|
"wu yl"的相关文件
显示项目 91-100 / 121 (共13页)
<< < 4 5 6 7 8 9 10 11 12 13 > >>
每页显示[10|25|50]项目
| 國立暨南國際大學 |
2007 |
Nanoscale bias-annealing effect in postirradiated thin silicon dioxide films observed by conductive atomic force Microscopy
|
吳幼麟?; Wu, YL |
| 國家衛生研究院 |
2006-02 |
Using endophenotypes for pathway clusters to map complex disease genes
|
Pan, WH;Lynn, KS;Chen, CH;Wu, YL;Lin, CY;Chang, HY |
| 國立臺灣大學 |
2006-02 |
Supramolecular assembly of gold(I) complexes of diphosphines and N,N’-bis-4-methylpyridyl oxalamide
|
Tzeng, BC; Yeh, HT; Wu, YL; Kuo, JH; Lee, GH; Peng, SM |
| 國立暨南國際大學 |
2006 |
Stress reliability comparison of metal-oxide-semiconductor devices with COSi2 and TiSi2 gate electrode?
|
吳幼麟?; Wu, YL |
| 國立暨南國際大學 |
2006 |
Investigation into the modelling of field-effect carrier mobility in disordered organic semiconductors
|
吳幼麟?; Wu, YL |
| 國立暨南國際大學 |
2006 |
Post-breakdown oxide voltage oscillation in thin SiO2 under nano-scaled repetitive ramped voltage stress
|
吳幼麟?; Wu, YL |
| 國立暨南國際大學 |
2006 |
Two-trap-assisted tunneling model for post-breakdown I-V characteristics in ultrathin silicon dioxide
|
吳幼麟?; Wu, YL |
| 國立暨南國際大學 |
2005 |
Radiation hardness comparison of MOS capacitors using tungsten polycide and cobalt polycide as gate electrode materials
|
吳幼麟?; Wu, YL |
| 國立暨南國際大學 |
2005 |
Characterization of electroplated copper film using a mixture of CuSO4 and CuSiF6 as the electrolyte
|
吳幼麟?; Wu, YL |
| 國立暨南國際大學 |
2005 |
Characterization of low temperature photo-assisted metal-organic chemical vapor deposited copper films using hexafluoroacetylacetonate copper(I) trimethylvinylsilane as precursor?
|
吳幼麟; Wu, YL |
显示项目 91-100 / 121 (共13页)
<< < 4 5 6 7 8 9 10 11 12 13 > >>
每页显示[10|25|50]项目
|
