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Showing items 1-12 of 12 (1 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:39:27Z |
Memory effect of oxide/SiC : O/oxide sandwiched structures
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Chang, TC; Yan, ST; Yang, FM; Liu, PT; Sze, SM |
| 國立交通大學 |
2014-12-08T15:38:58Z |
Memory effect of oxide/SiC : O/oxide sandwiched structures" (vol 84, pg 2094, 2004)
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Chang, TC; Yan, ST; Yang, FM; Liu, PT; Sze, SM |
| 國立交通大學 |
2014-12-08T15:37:01Z |
Memory effect of oxide/oxygen-incorporated silicon carbide/oxide sandwiched structure
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Chang, TC; Liu, PT; Yan, ST; Yang, FM; Sze, SM |
| 國立交通大學 |
2014-12-08T15:18:43Z |
Damage effect of fluorine implantation on PECVD alpha-SiOC barrier dielectric
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Yang, FM; Chang, TC; Liu, PT; Chen, CW; Tai, YH; Lou, JC |
| 國立交通大學 |
2014-12-08T15:05:15Z |
FORMATION OF COBALT SILICIDE UNDER A PASSIVATING FILM OF MOLYBDENUM OR TUNGSTEN
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YANG, FM; CHEN, MC |
| 國立交通大學 |
2014-12-08T15:05:01Z |
FORMATION OF SELF-ALIGNED COBALT SILICIDE IN NORMAL FLOW NITROGEN FURNACE
|
YANG, FM; CHEN, MC |
| 國立交通大學 |
2014-12-08T15:04:57Z |
FORMATION OF BILAYER SHALLOW MOSI2/COSI2 SALICIDE CONTACT USING W/CO-MO ALLOY METALLIZATION
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YANG, FM; CHEN, MC |
| 國立交通大學 |
2014-12-08T15:04:33Z |
EVALUATION OF INSITU FORMED W-TI AND MOSI2 AS A DIFFUSION BARRIER TO AL FOR COSI2 SILICIDED CONTACT
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YANG, FM; CHEN, MC |
| 國立交通大學 |
2014-12-08T15:04:24Z |
METALLIZATION OF W/CO-TI/SI AND SIMULTANEOUS FORMATION OF DIFFUSION BARRIER AND SHALLOW COSI2 CONTACT IN NORMAL FLOWING-NITROGEN FURNACE
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YANG, FM; PENG, JG; HUANG, TS; HUANG, SL; CHEN, MC |
| 國立交通大學 |
2014-12-08T15:04:10Z |
PHASE-TRANSFORMATION OF MO AND W OVER CO OR ITS ALLOY IN CONTACT WITH SI
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YANG, FM; CHEN, MC |
| 國家衛生研究院 |
2005-06-05 |
High-efficiency protein expression mediated by enterovirus 71 internal ribosome entry
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Lee, JC; Wu, TY; Huang, CF; Yang, FM; Shih, SR; Hsu, JTA |
| 國立臺灣大學 |
2004-12 |
Beta-amylase is not involved in degradation of endosperm starch during germination of maize.
|
Wang, SM; Yang, FM; Chou, AH |
Showing items 1-12 of 12 (1 Page(s) Totally)
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