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國立成功大學 2022 pMOSFET with CVD-grown 2D semiconductor channel enabled by ultra-thin and fab-compatible spacer doping Hung, T.Y.T.;Li, M.-Z.;Yun, W.S.;Chou, S.A.;Su, Su S.-K.;Chen, E.;Liew, S.L.;Yang, Yang Y.-M.;Lin, K.-I.;Hou, V.;Lee, T.Y.;Wang, H.;Cheng, A.;Lin, M.-T.;Wong, H.-S.P.;Radu, I.P.

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