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Showing items 212991-213000 of 2348973 (234898 Page(s) Totally)
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| 國立成功大學 |
2000-07 |
Atomic layer epitaxy growth of ZnSxSe1-x epitaxial layers lattice-matched to Si substrates
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Chen, Nyen-Ts; Yokoyama, Meiso; Ueng, Herng-Yih |
| 國立中山大學 |
2000 |
Atomic Layer Epitaxy Growth of ZnSXSe1-X Epitaxial Layers Lattice-Matched to Si Substrates
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N.T. Chen; M. Yokoyama; H.Y. Ueng |
| 臺大學術典藏 |
2020-06-11T06:23:09Z |
Atomic layer etchings of transition metal dichalcogenides with post healing procedures: Equivalent selective etching of 2D crystal hetero-structures
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Chen, K.-C.;Chu, T.-W.;Wu, C.-R.;Lee, S.-C.;Lin, S.-Y.; Chen, K.-C.; Chu, T.-W.; Wu, C.-R.; Lee, S.-C.; Lin, S.-Y.; SI-CHEN LEE |
| 國立交通大學 |
2019-04-02T05:58:22Z |
Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam
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Ohori, Daisuke; Fujii, Takuya; Noda, Shuichi; Mizubayashi, Wataru; Endo, Kazuhiko; Lee, En-Tzu; Li, Yiming; Lee, Yao-Jen; Ozaki, Takuya; Samukawa, Seiji |
| 臺大學術典藏 |
2021-08-21T23:58:56Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou, Chun Yi; Lee, Wei Hao; Chuu, Chih Piao; Chen, Tse An; Hou, Cheng Hung; Yin, Yu Tung; Wang, Ting Yun; Shyue, Jing Jong; Li, Lain Jong; MIIN-JANG CHEN |
| 臺大學術典藏 |
2022-03-22T08:27:46Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou C.-Y;Lee W.-H;Chuu C.-P;Chen T.-A;Hou C.-H;Yin Y.-T;Wang T.-Y;Shyue J.-J;Li L.-J;Chen M.-J.; Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN |
| 臺大學術典藏 |
2022-03-22T08:30:45Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou C.-Y;Lee W.-H;Chuu C.-P;Chen T.-A;Hou C.-H;Yin Y.-T;Wang T.-Y;Shyue J.-J;Li L.-J;Chen M.-J.; Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN |
| 臺大學術典藏 |
2022-03-22T08:30:47Z |
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
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Chou C.-Y;Lee W.-H;Chuu C.-P;Chen T.-A;Hou C.-H;Yin Y.-T;Wang T.-Y;Shyue J.-J;Li L.-J;Chen M.-J.; Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN |
| 元智大學 |
Sep-18 |
Atomic Layer Oxidation on Graphene Sheets for Tuning Their Oxidation Levels, Electrical Conductivities, and Band Gaps
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S. Gu; Chien-Te Hsieh; T.-W. Lin; C.-Y. Yuan; Y. Ashraf Gandomi; J.-K. Chang; J. Li |
| 國立交通大學 |
2019-04-02T05:58:34Z |
Atomic layer oxidation on graphene sheets for tuning their oxidation levels, electrical conductivities, and band gaps
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Gu, Siyong; Hsieh, Chien-Te; Lin, Tzu-Wei; Yuan, Chun-Yao; Gandomi, Yasser Ashraf; Chang, Jeng-Kuei; Li, Jianlin |
Showing items 212991-213000 of 2348973 (234898 Page(s) Totally)
<< < 21295 21296 21297 21298 21299 21300 21301 21302 21303 21304 > >>
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