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Institution	Date	Title	Author
國立中山大學	2003	Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-ray Exposure Technology	T.C. Chang;T.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;J.T. Sheu;T.Y. Tseng
國立中山大學	2003	Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology	T.C. Chang;H.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;T.Y. Tsing
國立交通大學	2014-12-08T15:40:42Z	Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003)	Chang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Sheu, JT; Tseng, TY
國立暨南國際大學	2003	Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003)?	許鉦宗; Sheu, JT
國立成功大學	2010-02	Direct patterning of metallic micro/nano-structures on flexible polymer substrates by roller-based contact printing and infrared heating	Chen, Chun-Hung; Yu, Te-Hui; Lee, Yung-Chun
亞洲大學	2008	Direct patterning of silicon nitride thin film by projection photoablation for fabricating thin-film-transistor liquid crystal displays	C. N. Chen, G. M. Wu, W. S. Feng, H. W. Jean
中原大學	2009-02	Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope	Jih-Shang Hwang;Li-Wei Chen;Te-Chang Chen;Chi-Wen Kuo;Zhan-Shuo Hu;Tsong-Ru Tsai;Yuen-Jung Wu;Tai-Yuan Lin;Yuan-Yu Jhuo;Chih-Yung Cheng;Chih-Ming Lin;Yi-Hung Liu
國立臺灣海洋大學	2009-02-04	Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope	J. S. Hwang;L. W. Chen;T. C. Chen;C. W. Kuo;Z. S. Hu;T. R. Tsai;Y. J. Wu;T. Y. Lin;Y. Y. Jhuo;C. Y. Chen;C. M. Lin;Y. H. Liu
淡江大學	2015-11-26	Direct Patterning with Femtosecond Laser for Fabricating Ge2Sb2Te5 Stamps and Imprinting of UV Resins.	Lin, C.B.;Cheng, Po-Yuan;Lino, Hung Yi
淡江大學	2015-12	Direct Patterning with Femtosecond Laser for Fabricating Ge2Sb2Te5 Stamps and Imprinting of UVResins	C.B. Lin, Po-Yuan Cheng and Hung Yi Lino

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