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Showing items 354686-354695 of 2348973 (234898 Page(s) Totally) << < 35464 35465 35466 35467 35468 35469 35470 35471 35472 35473 > >> View [10|25|50] records per page
| 國立交通大學 |
2014-12-08T15:05:39Z |
EFFECT OF CARBON ON THE WELDABILITY OF FE-MN-AL ALLOYS
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CHOU, CP; LEE, CH |
| 東海大學 |
2011-05-22 |
Effect of carbon source and high C/N ratio in the cellulosic hydrolysate- based media on the crude lipid contents and unsaturated fatty acid compositions of yeasts.
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Yi-Huang Chang, Ku-Shang Chang, Hung-Der Jang and Chuan-Liang Hsu; 徐詮亮 |
| 東海大學 |
2009 |
Effect of carbon source on the biomass and lipid contents of yeasts.PP. 120-06
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Chuan-Liang Hsu, |
| 元培科技大學 |
2009-06-06 |
Effect of carbon source on the biomass, crude lipid contents and unsaturated fatty acid composition of yeasts
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Jang, H.-D-; Hsu, C.-L.; Chang, K.-S.; Chuang, L.-T.; Su, M.-S. |
| 元培科技大學 |
2009-06-07 |
Effect of carbon source on the biomass, crude lipid contents and unsaturated fatty acid compositions of yeasts
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Jang, Hung-Der; Hsu, Chuan-Liang; Chang, Ku-Shang; Chuang, Lu-Te; Su, Min-Sheng |
| 元培科技大學 |
2009-06-08 |
Effect of carbon source on the biomass, crude lipid contents and unsaturated fatty acid compositions of yeasts
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Jang, Hung-Der; Hsu Chuan-Liang;Chang Ku-Shang; Chuang Lu-Te; Su Min-Sheng |
| 元培科技大學 |
2008-12-03 |
Effect of carbon source on the growth and crude lipid contents of yeasts
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Chow Pui-Yu; Jang Hung-Der; Chuang Lu-Te; Chang Ku-Shang; Chang Ku-Shang |
| 大葉大學 |
2015-03-17 |
Effect of carbon sources on growth and lipid accumulation of newly isolated microalgae cultured under mixotrophic condition
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Lin, Tse-Shih;Yii, Wu Jane |
| 臺大學術典藏 |
2020-01-06T03:11:09Z |
Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
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Wu, J. J.; Chen, K. H.; Wen, C. Y.; Chen, L. C.; Guo, X. J.; Lo, H. J.; Lin, S. T.; Yu, Y. C.; Wang, C. W.; Lin, E. K.; SHIANG-TAI LIN |
| 臺大學術典藏 |
2022-08-09T03:50:47Z |
Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
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Wu J.J.; Chen K.H.; Wen C.Y.; Chen L.C.; Guo X.-J.; Lo H.J.; Lin S.T.; Yu Y.-C.; Wang C.-W.; Lin E.-K.; Wu J.J.; Chen K.H.; Wen C.Y.; Chen L.C.; Guo X.-J.; Lo H.J.; Lin S.T.; Yu Y.-C.; Wang C.-W.; Lin E.-K.; LI-CHYONG CHEN |
Showing items 354686-354695 of 2348973 (234898 Page(s) Totally) << < 35464 35465 35466 35467 35468 35469 35470 35471 35472 35473 > >> View [10|25|50] records per page
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