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顯示項目 197091-197100 / 2348570 (共234857頁)
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機構 日期 題名 作者
國立成功大學 2023 Application of IoT Technology in Healthcare: A Case Study of LoRa Technology Lin, J.-H.;Chen, Chen C.;Cheng, Y.-T.
中華大學 2010 Application of IPA and Back-Propagation Neural Network to Build a New Service Quality Decision Making Model 林淑萍; Lin, shu-ping
國立交通大學 2019-04-02T05:58:10Z Application of IR spectra of two successive isotope labeled residues to the evaluation of dihedral angles of polyproline II structure Miyata, Daisuke; Hiramatsu, Hirotsugu; Nakabayashi, Takakazu
元智大學 2017-09-22 Application of IRES for co-expression of heterologous genes in rice suspension cells 黃文杉; Li-Fen Huang; Shu-Yao Liao
臺大學術典藏 2018-09-10T04:08:55Z Application of irradiation-then-anneal treatment on the improvement of oxide properties in metal-oxide-semiconductor capacitors Lin, Jin-Jenn; Hwu, Jenn-Gwo; JENN-GWO HWU
國立臺灣大學 1992 Application of Irradiation-Then-Anneal Treatment on the Improvement of Oxide Properties in Metal-Oxide-Semiconductor Capacitors Lin, J. J.; 胡振國; Lin, J. J.; Hwu, Jenn-Gwo
國立臺灣大學 1996 Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics Lee, Kuo-Chung; Hwu, Jenn-Gwo
臺大學術典藏 2018-09-10T05:52:21Z Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics Lee, K.-C.;Hwu, J.-G.; Lee, K.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏 1994 Application of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectrics Lee, K. C.; Hwu, Jenn-Gwo; Lee, K. C.; 胡振國; Hwu, Jenn-Gwo
國立臺灣大學 1994 Application of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectrics Lee, K. C.; 胡振國; Lee, K. C.; Hwu, Jenn-Gwo

顯示項目 197091-197100 / 2348570 (共234857頁)
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