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教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
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顯示項目 355461-355470 / 2348971 (共234898頁)
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每頁顯示[10|25|50]項目
| 國立聯合大學 |
2006 |
Effect of Deposition Parameters on the Growth Rate and Dielectric Properties of the Ba(SnxTi1-x)O3 Thin Films Prepared by Radio Frequency Magnetron Sputtering
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Hong-Hsin Huang, Moo-Chin Wang, Chung-Yuan Chen, Nan-Chung Wu and Huey-Jiuan Lin |
| 國立臺灣科技大學 |
2010 |
Effect of deposition potential on the physical properties of electrodeposited CuO thin films
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Mahalingam T.; Dhanasekaran V.; Ravi G.; Lee S.; Chu J.P.; Lim H.-J. |
| 元智大學 |
2023-12-01 |
Effect of deposition pressure on the optoelectronic characteristics of p-type Cu-doped CrO2 thin films
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Yun-Jui Yeh; Yu-En Chen; Bhavya Kondapavuluri; Tsung-An Yang; Sindu Gnanam A B; Sriranjani SIVASUBRAMANIAN; Balaji G; Wei-Sheng Liu |
| 國立臺灣科技大學 |
2010 |
Effect of deposition rate on device performance and lifetime of planar molecule-based organic light-emitting diodes
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Lee, C.C.;Liu, S.W.;Chung, Y.T. |
| 國立聯合大學 |
2008 |
Effect of deposition sequence of platinum and ruthenium particles into nanofibrous network of polyaniline-poly(styrene sulfonic acid) on electrocatalytic oxidation of methanol
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Feng-Jiin Liu, Li-Ming Huang, Ten-Chin Wen, Ching-Fan Li, Shu-Ling Huang, A. Gopalan |
| 國立成功大學 |
2008-09 |
Effect of deposition sequence of platinum and ruthenium particles into nanofibrous network of polyaniline-poly(styrene sulfonic acid) on electrocatalytic oxidation of methanol
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Liu, Feng-Jiin; Huang, Li-Ming; Wen, Ten-Chin; Li, Ching-Fan; Huang, Shu-Ling; Gopalan, A. |
| 國立交通大學 |
2014-12-08T15:17:21Z |
Effect of deposition temperature and oxygen flow rate on properties of low dielectric constant SiCOH film prepared by plasma enhanced chemical vapor deposition using diethoxymethylsilane
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Cheng, YL; Wang, YL; Hwang, GJ; O'Neill, ML; Karwacki, EJ; Liu, PT; Chen, CF |
| 國立交通大學 |
2014-12-08T15:12:16Z |
Effect of deposition temperature on the channel and contact resistance of pentacene thin-film transistors
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Chen, Ying-Pin; Chen, Fang-Chung |
| 國立交通大學 |
2014-12-08T15:39:16Z |
Effect of deposition temperature, on thermal stability in high-density plasma chemical vapor deposition fluorine-doped silicon dioxide
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Cheng, YL; Wang, YL; Chen, HW; Lan, JL; Liu, CP; Wu, SA; Wu, YL; Lo, KY; Feng, MS |
| 國立暨南國際大學 |
2004 |
Effect of deposition temperature, on thermal stability in high-density plasma chemical vapor deposition fluorine-doped silicon dioxide?
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吳幼麟; Wu, YL |
顯示項目 355461-355470 / 2348971 (共234898頁)
<< < 35542 35543 35544 35545 35546 35547 35548 35549 35550 35551 > >>
每頁顯示[10|25|50]項目
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