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機構 日期 題名 作者
國立臺灣大學 2007 Rigorous contour integral analysis of generalized Keldysh theory of strong laser photoionization Mineo, H.; Chao, S. D.; Mishima, K.; Nagaya, K.; Hayashi, M.; Lin, S. H.
臺大學術典藏 2020-04-01T07:57:49Z Rigorous contour integral analysis of generalized Keldysh theory of strong laser photoionization Lin, S. H.; Hayashi, M.; Mishima, K.; Nagaya, K.; Chao, S. D.; Mineo, H.
國立成功大學 2014-01 Rigorous Design and Optimization of Brushless PM Motor Using Response Surface Methodology with Quantum-Behaved PSO Operator Gaing, Zwe-Lee; Lin, Cin-Hsien; Tsai, Ming-Hsiao; Hsieh, Min-Fu; Tsai, Mi-Ching
臺大學術典藏 2020-01-06T03:08:24Z Rigorous Design and Optimization of Methyl Glycolate Production Process through Reactive Distillation Combined with a Middle Dividing-Wall Column Yang, S.-B.; Chien, I.-L.; I-LUNG CHIEN
國立交通大學 2014-12-08T15:05:31Z RIGOROUS DISPERSIVE ANALYSIS OF SKIN EFFECTS ON A PRINTED MICROSTRIP LINE CONTAINING FINITE CONDUCTOR LOSSES TZUANG, CKC; WANG, WK
國立交通大學 2014-12-08T15:06:07Z Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask Lin, Chun-Hung; Chen, Hsuen-Li; Ko, Fu-Hsiang
臺大學術典藏 2007 Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask Lin, Chun-Hung; Chen, Hsuen-Li; Ko, Fu-Hsiang; Lin, Chun-Hung; Chen, Hsuen-Li; Ko, Fu-Hsiang
國立成功大學 2007 Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask Lin, Chun-Hung; Chen, Hsuen-Li; Ko, Fu-Hsiang
國立臺灣大學 2007 Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask Lin, Chun-Hung; Chen, Hsuen-Li; Ko, Fu-Hsiang
臺大學術典藏 2019-12-19T07:12:58Z Rigorous Estimation of Local Accuracies Revisited Soler, Tomas; Han, Jen-Yu; JEN-YU HAN

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