臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

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Showing items 197091-197100 of 2348511 (234852 Page(s) Totally)
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Institution	Date	Title	Author
國立交通大學	2019-04-02T05:58:10Z	Application of IR spectra of two successive isotope labeled residues to the evaluation of dihedral angles of polyproline II structure	Miyata, Daisuke; Hiramatsu, Hirotsugu; Nakabayashi, Takakazu
元智大學	2017-09-22	Application of IRES for co-expression of heterologous genes in rice suspension cells	黃文杉; Li-Fen Huang; Shu-Yao Liao
臺大學術典藏	2018-09-10T04:08:55Z	Application of irradiation-then-anneal treatment on the improvement of oxide properties in metal-oxide-semiconductor capacitors	Lin, Jin-Jenn; Hwu, Jenn-Gwo; JENN-GWO HWU
國立臺灣大學	1992	Application of Irradiation-Then-Anneal Treatment on the Improvement of Oxide Properties in Metal-Oxide-Semiconductor Capacitors	Lin, J. J.; 胡振國; Lin, J. J.; Hwu, Jenn-Gwo
國立臺灣大學	1996	Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics	Lee, Kuo-Chung; Hwu, Jenn-Gwo
臺大學術典藏	2018-09-10T05:52:21Z	Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics	Lee, K.-C.;Hwu, J.-G.; Lee, K.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	1994	Application of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectrics	Lee, K. C.; Hwu, Jenn-Gwo; Lee, K. C.; 胡振國; Hwu, Jenn-Gwo
國立臺灣大學	1994	Application of Irradiation-Then-Nitridation to the Improvement of Radiation Hardness in MOS Gate Dielectrics	Lee, K. C.; 胡振國; Lee, K. C.; Hwu, Jenn-Gwo
國立臺灣科技大學	1990	Application of Isoparametric Element of Metal Rolling Process by Finite Element Method	Huang, You-Min;Lu, Y. H.
元智大學	2006-06	Application of IT in JIT material supplying system of an automobile parts industries	張百棧; 劉鎮豪; 王彥文

Showing items 197091-197100 of 2348511 (234852 Page(s) Totally)
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