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Showing items 446061-446070 of 2348617 (234862 Page(s) Totally) << < 44602 44603 44604 44605 44606 44607 44608 44609 44610 44611 > >> View [10|25|50] records per page
| 國立臺灣大學 |
2004-10 |
Ge Outdiffusion Effect on Flicker Noise in Strained-Si nMOSFETs
|
Hua, W.C.; Lee, M.H.; Chen, P.S.; Maikap, S.; Liu, C.W.; Chen, K.M. |
| 臺大學術典藏 |
2018-09-10T04:55:29Z |
Ge outdiffusion effect on flicker noise in strained-Si nMOSFETs
|
Hua, W.-C.; Lee, M.H.; Chen, P.S.; Maikap, S.; Liu, C.W.; Chen, K.M.; CHEE-WEE LIU |
| 國立臺灣大學 |
2003 |
Ge quantum dots sandwiched between two thick Si blocking layers to block the dark current and tune the responsivity spectrum
|
Peng, Y. H.; Chen, C. C.; Kuan, C. H.; Cheng, H. H. |
| 國立臺灣大學 |
2003-01 |
Ge quantum dots sandwiched between two thick Si blocking layers to block the dark current and tune the responsivity spectrum
|
Peng, Y. H.; Chen, C. C.; Kuan, C. H.; Cheng, H. H. |
| 臺大學術典藏 |
2003 |
Ge quantum dots sandwiched between two thick Si blocking layers to block the dark current and tune the responsivity spectrum
|
CHIEH-HSIUNG KUAN; Cheng, H.H.; Kuan, C.H.; Chen, C.C.; Peng, Y.H.; Peng, Y.H.;Chen, C.C.;Kuan, C.H.;Cheng, H.H. |
| 臺大學術典藏 |
2018-09-10T04:12:36Z |
Ge quantum dots sandwiched between two thick Si blocking layers to increase high detectivity
|
Peng, Y.H.; Chen, C.C.; Kuan, C.H.; Cheng, H.H.; CHIEH-HSIUNG KUAN |
| 國立臺灣大學 |
2002 |
Ge quantum dots sandwiched between two thick Si blocking layers to increase high detectivity
|
Peng, Y.H.; Chen, C.C.; Kuan, C.H.; Cheng, H.H. |
| 國立交通大學 |
2014-12-08T15:28:41Z |
Ge technology beyond Si CMOS
|
Chin, Albert |
| 國立成功大學 |
2010-07-01 |
Ge-doped In2O3和In2Ge2O7奈米線的調控生長及光學性質研究
|
游智凱; Yu, Chih-Kai |
| 國立成功大學 |
2010-07-01 |
Ge-doped In2O3和In2Ge2O7奈米線的調控生長及光學性質研究
|
游智凱; Yu, Chih-Kai |
Showing items 446061-446070 of 2348617 (234862 Page(s) Totally) << < 44602 44603 44604 44605 44606 44607 44608 44609 44610 44611 > >> View [10|25|50] records per page
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