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Showing items 710986-710995 of 2348719 (234872 Page(s) Totally) << < 71094 71095 71096 71097 71098 71099 71100 71101 71102 71103 > >> View [10|25|50] records per page
| 國立交通大學 |
2014-12-08T15:02:31Z |
Reactive ion etching of GaN with BCl3/SF6 plasmas
|
Feng, MS; Guo, JD; Lu, YM; Chang, EY |
| 國立交通大學 |
2019-04-02T05:58:30Z |
Reactive ion etching of GaN with BCl3/SF6 plasmas
|
Feng, MS; Guo, JD; Lu, YM; Chang, EY |
| 國立交通大學 |
2014-12-12T02:11:24Z |
Reactive ion etching of InP and InGaP using CH□/H□mixtures
|
陳昶儒; Chen, Chang-Ru; 張國明; Zhang, Guo-Ming |
| 中原大學 |
1999 |
Reactive Ion Etching of Ir Films with a TiN Mask in Ar/O2/BCl3 Helicon Wave Plasma
|
T.C.Wei;M.C.Chiang;F.M.Pan;T.P.Liu;B.T.Dai;H.C.Chien; |
| 中原大學 |
1992 |
Reactive ion etching of polyimidesiloxanes in fluorine-containing discharges
|
S. Jeng;H.S. Kwok;J.A. Tyrell |
| 國立成功大學 |
1999-07-15 |
Reactive ion etching of Si SiGe in CF4/Ar and Cl-2/BCl3/Ar discharges
|
Chang, Shoou-Jinn; Juang, Y. Z.; Nayak, D. K.; Shiraki, Y. |
| 國立成功大學 |
2000-06 |
Reactive ion etching of ZnSe, ZnSSe, ZnCdSe and ZnMgSSe by H-2/Ar and CH4/H-2/Ar
|
Chen, W. R.; Chang, Shoou-Jinn; Su, Yan-Kuin; Lan, Wen-How; Lin, A. C. H.; Chang, H |
| 國立成功大學 |
2007-03 |
Reactive ion etching technique for via-hole applications in thick GaAs wafers
|
Wang, Chih-Cheng; Lin, Yu-Lu; Lin, Shun-Kuan; Li, Chun-Sheng; Huang, Hou-Kuei; Wu, Chang-Luen; Chang, Chian-Sern; Wang, Yeong-Her |
| 國立交通大學 |
2014-12-08T15:45:10Z |
Reactive ion pretreatment technique to improve the ashing resistance of low dielectric constant high carbon content polymer
|
Chang, KM; Yang, JY; Chang, YH; Tsai, JY |
| 國立成功大學 |
2019-03-15 |
Reactive magnetron sputter-deposited TiNxOy multilayered solar selective coatings
|
Li;Cho-Yen;Sari;Indah, Fitri Nur;Ting;Jyh-Ming |
Showing items 710986-710995 of 2348719 (234872 Page(s) Totally) << < 71094 71095 71096 71097 71098 71099 71100 71101 71102 71103 > >> View [10|25|50] records per page
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