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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立臺灣大學 1992 Removal of Emulsified Oil from Waste Water by Electrophoretic Coalescence 葛煥彰; Keh, Huan-Jang
國立交通大學 2014-12-08T15:46:45Z Removal of end-of-range defects in Ge+-pre-amorphized Si by carbon ion implantation Chen, PS; Hsieh, TE; Chu, CH
國立成功大學 2023-08-20 Removal of endocrine disruptor compounds, CO2 fixation, and macromolecules accumulation in Thermosynechococcus sp. CL-1 cultivation Winayu;Rara, Birgitta Narindri;Cheng;Fang, Hsiu;Hsueh;Hsin-Ta;Chu;Hsin
義守大學 2013-10 Removal of Endotoxin from Collagen Solution by Lectin-grafted Silica Beads HUANG Zhong-Fa;CHANG Shwu-Jen;LAN Cheng-Wen;WU Kun-Lieh;CHEN Shu-Ying;LIN Yi-Wen;KUO Shyh-Ming
臺大學術典藏 2020-02-25T06:10:10Z Removal of environmental estrogens by bacterial cell immobilization technique Ma, C.; Qin, D.; Sun, Q.; Zhang, F.; Liu, H.; Yu, C.-P.; CHANG-PING YU
淡江大學 2017-09-11 Removal of Escherichia coli using capacitive deionization (CDI) Chien, I-Chieh;Wang, Wen-Zeng
臺大學術典藏 2020-01-14T03:34:00Z Removal of fine particles from IC chip carbonization process in a rotating packed bed: Modeling and assessment Chen T.-L.;Huang T.-H.;Hsu C.-H.;Chen Y.-H.;Pan S.-Y.;Chiang P.-C.; Chen T.-L.; Huang T.-H.; Hsu C.-H.; Chen Y.-H.; Pan S.-Y.; Chiang P.-C.; SHU-YUAN PAN
臺大學術典藏 2020-02-25T06:11:46Z Removal of fine particles from IC chip carbonization process in a rotating packed bed: Modeling and assessment PEN-CHI CHIANG;Chiang, P.-C.;Pan, S.-Y.;Chen, Y.-H.;Hsu, C.-H.;Huang, T.-H.;Chen, T.-L.; Chen, T.-L.; Huang, T.-H.; Hsu, C.-H.; Chen, Y.-H.; Pan, S.-Y.; Chiang, P.-C.; PEN-CHI CHIANG
臺北醫學大學 2004 Removal of fish bones in the oropharynx and hypopharynx under video laryngeal telescopic guidance 李飛鵬; Lee FP
國立臺灣科技大學 2017 Removal of fixation construct could mitigate adjacent segment stress after lumbosacral fusion: A finite element analysis Hsieh, Y.-Y;Chen, Chen C.-H;Tsuang, F.-Y;Wu, L.-C;Lin, S.-C;Chiang, Chiang C.-J.
臺大學術典藏 2020-09-29T03:36:18Z Removal of fixation construct could mitigate adjacent segment stress after lumbosacral fusion: A finite element analysis Hsieh Y.-Y.; Chen C.-H.; FON-YIH TSUANG; Wu L.-C.; Lin S.-C.; Chiang C.-J.
國立臺灣科技大學 2011 Removal of fluoride from aqueous solution by aluminum-loaded Duolite C-467 resin Ku, Y.;Chiou, H.M.;Chen, H.W.
國立臺灣大學 2011 Removal of fluoride from aqueous solution with the superparamagnetic zirconia material Chang, Chiung-Fen; Chang, Ching-Yuan; Hsu, Tzu-Ling
東海大學 2011-09 Removal of Fluoride from Aqueous Solution with the Superparamagnetic Zirconia Material. Chang, C.F., Chang, C.Y. and Hsu, T..; 張瓊芬
東海大學 2011-09 Removal of Fluoride from Aqueous Solution with the Superparamagnetic Zirconia Material. Chang, C.F., Chang, C.Y. and Hsu, T..; 張瓊芬
臺大學術典藏 2020-02-25T06:13:06Z Removal of fluoride from semiconductor wastewater by electrocoagulation- flotation SHANG-LIEN LO;Lee, Y.D.;Kuan, W.H.;Lo, S.L.;Hu, C.Y.; Hu, C.Y.; Lo, S.L.; Kuan, W.H.; Lee, Y.D.; SHANG-LIEN LO
臺北醫學大學 2005 Removal of Fluoride from Semiconductor Wastewater by Electrocoagulation-Flotation (ECF) 胡景堯; Hu CY;Lo SL;Kuan WH;Lee YD
國立臺灣大學 2005 Removal of fluoride from semiconductor wastewater by electrocoagulation–flotation Hu, C.Y.; Lo, S.L.; Kuan, W.H.; Lee, Y.D.
亞洲大學 2009 Removal of fluoride ions from aqueous solution using modified attapulgite as adsorbent Zhang, J.;Xie, S.D.;Ho, Y.S.
亞洲大學 2009-06 Removal of fluoride ions from aqueous solution using modified attapulgite as adsorbent Zhang, J (Zhang, Jing); Xie, SD (Xie, Shaodong); Ho, YS (Ho, Yuh-Shan)
亞洲大學 2009 Removal of fluoride ions from aqueous solution using modified attapulgite as adsorbent Zhang, Jing; Xie, Shaodong ; Ho, Yuh-Shan
亞洲大學 2009-06 Removal of fluoride ions from aqueous solution using modified attapulgite as adsorbent 何玉山
中山醫學大學 2021 Removal of fractured implant screw under the microscope and transformation of cemented-type crown into screw-retained crown simultaneously: A clinical report Chen, WC; Chang, YC
元智大學 2002-11 Removal of free and chelated Cu(II) ions from water by a nondispersive solvent extraction process 莊瑞鑫; S.H. Lin
臺大學術典藏 2018-09-10T04:31:32Z Removal of GaAs surface contaminants using H2 electron cyclotron resonance plasma treatment followed by Cl2 chemical etching Hong, M;Freund, RS;Choquette, KD;Luftman, HS;Mannaerts, JP;Wetzel, RC; Hong, M; Freund, RS; Choquette, KD; Luftman, HS; Mannaerts, JP; Wetzel, RC; MINGHWEI HONG

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