臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:45:55Z	Electrical characteristics of polyoxide prepared by N-2 preannealing	Chang, KM; Lee, TC; Wang, JY
國立中山大學	2006	Electrical characteristics of postmetallization-annealed MOCVD-TiO2 films on ammonium sulfide-treated GaAs	Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang; Shi-Hao Lin
國立中山大學	2007	Electrical Characteristics of Strontium Titanate Films Prepared by Liquid Phase Deposition	Ming-Kwei Lee; Hung-Chang Lee; Zhen-Hui Lee
國立交通大學	2014-12-08T15:04:37Z	ELECTRICAL CHARACTERISTICS OF TEXTURED POLYSILICON OXIDE PREPARED BY A LOW-TEMPERATURE WAFER LOADING AND N-2 PREANNEALING PROCESS	WU, SL; LIN, TY; LEE, CL; LEI, TF
國立交通大學	2014-12-08T15:12:55Z	Electrical characteristics of the HfAlON gate dielectric with interfacial UV-ozone oxide	Chen, Yung-Yu; Fu, Wen-Yu; Yeh, Ching-Fa
國立交通大學	2014-12-08T15:43:27Z	Electrical characteristics of thin cerium oxide film on silicon substrate by reactive DC sputtering	Pan, TM; Chien, CH; Lei, TF; Chao, TS; Huang, TY
國立交通大學	2014-12-08T15:36:22Z	Electrical characteristics of thin HfO(2) gate dielectrics prepared using different pre-deposition surface treatments	Chen, CW; Chien, CH; Perng, TH; Yang, MJ; Liang, JS; Lehnen, P; Tsui, BY; Chang, CY
國立交通大學	2019-04-02T06:00:17Z	Electrical characteristics of thin HfO2 gate dielectrics prepared using different pre-deposition surface treatments	Chen, CW; Chien, CH; Perng, TH; Yang, MJ; Liang, JS; Lehnen, P; Tsui, BY; Chang, CY
國立交通大學	2014-12-08T15:03:33Z	ELECTRICAL CHARACTERISTICS OF THIN-FILM TRANSISTORS WITH DOUBLE-ACTIVE-LAYER STRUCTURE	TSAI, MJ; WANG, PW; SU, HP; CHENG, HC
國立臺灣大學	2004	Electrical characteristics of ultra-thin gate oxides (<3 nm) prepared by direct current superimposed with alternating-current anodization	Chen, Zhi-Hao; Huang, Szu-Wei; Hwu, Jenn-Gwo

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